Base Technology
NanoScale Systems has many years of experience and spezial know-how in the software-controlled manufacturing of high-resolution nano structures as well as market introduction of new product generations in the microsystem technology field and surface technologies.
In this our unique processing technology (direct writing using highly focused electronic and ion beams (EBID/IBID) is the ideal platform for the provision of innovative applications that have micro and nanotechnological background.
The consequently continued blending of conventional semiconductor methods with alternative “bottom-up” technologies enables us to provide new tools for the manipulation, visualization and measuring of objects right up to the molecular and atomic scale.
This new way allows us an unparalleled and with nanometer precision guaranteed manufacturing of functional structures and material, which possess system dimensions clearly below 50 nanometers and which have angle precision in the range of 1 to 3 nanometers. Due to their nano crystalline character these composite material (nanocomposites), which do not exist in nature possess improved properties which in many respects are superior to conventional material used.
In contrast to the most widespread microstructuring technologies for the technology developed by us there is no semiconductor work environment (clean room) needed.
Without the use of photomasks and silicon as base substrate we furthermore reduce the large number of complex and error prone processes, usually required, to just a few steps. Thus we already in the production phases assure high flexibility and considerable time saving. These advantages predestine the procedure especially for those critical areas in which fast results (Rapid Prototyping) and cost reduction in development and testing of new microstructure applications (e.g. computer chips) is crucial.